Price: 10.00
A new generation of electron beam accelerators that operates in the 80 kV — 110 kV range has
been developed. This will enable users to obtain all of the benefits of electron beam curing,
while eliminating several drawbacks. Electrons accelerated at these low energies are best
suited for surface treatment. Energy deposition is maximized in the top 5 to 10 2 of the
coating, ink, or other material being processed. The ability of the electrons then to rapidly
dissipate their energy will allow the use of radiation sensitive substrates. Some of the other
advantages include more compact, less expensive equipment with higher processing speeds
and lower power consumption. Equipment capabilities, including a revolutionary window design
and dosimetnc measurements at these low voltages, will be presented.
