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The "classic" electron beam technology, which began in the early 50's, made use of
accelerating energies in the voltage range of 300 to 800 kV. The first EB processors built
for the curing of coatings operated at 300 kV. Most EB applications which were
successfully developed in the 50's and 60's were for crosslinking of plastic materials and
required higher energies. The products to be treated were thicker than a simple layer of
coating with thicknesses up to maybe one hundred microns. As a consequence of this the
industry concentrated on the development of EB processors with energies between 500 kV
and several millions volts. The generation of (very) high DC voltages and power output
levels up to 100 kW and higher was the main concern of the manufacturers of EB systems
in those days. It was only in the beginning of the 1970's that industrial EB processors with
accelerating voltages below 300 kV appeared on the market. ESI was the pioneering
company and developed a new type of EB processor, the Electrocurtain, the first
commercial electron accelerator without a beam scanner. The beam scanner is a device
used to uniformly distribute a pencil shaped beam of electrons over the surface of the
product. The new EB machine featured a linear cathode, emitting a "shower" or "curtain"
