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The first description of a two-photon induced photopolymerization (TPIP) is about a decade ago. Since then, researchers are trying to improve this novel Additive Manufacturing Technology MT). Higher resolutions, faster writing speeds, improved processing windows, the possibility of using multiple exposure spots and so one, in order to push this novel technique into the commercial market for various future applications such as different mechanical, electronic and optical micro devices, polymer-based optical waveguides on integrated circuit boards,[3, 4] and other areas, where resolutions down to 100 nm and a real 3D writing process are needed. In order to reach these high demands a proper laser system and a precise structuring device are of importance. Nevertheless, the photoinitiating system still plays a key role in this process to obtain an efficient polymerization and therefore high quality structures and resolutions. A full understanding of the structure-activity relationship in this nonlinear process still remains unclear because of the small excited volume and short lifetimes of the excited species, which makes it extremely difficult to detect. It is currently known that two parameters are essential in order to have a highly reactive two-photon initiator (TPI). On the one hand a high two-photon absorption (TPA) cross-section, which is the essential parameter for the nonlinear absorption, and on the other hand a high quantum yield ofinitiation just like for conventional one-photon initiators.
