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1.Introduction.
Photosensitive polymer coatings for imaging applications have
achieved a high levelof performance at the end of this century.
Since their introduction in 1957 as relief printing plate and
a few years later,in other important fields of the graphic
arts,their market share has been characterized bya constant
growth rate.Simultaneously photoresists were introduced in
microelectronics. technology where they became an essential
tool.Together photopolymers for lithography and graphic applications
ingeneral and photoresists represent for microelectronics represent
the highest market share among the non—conventional silverless
imaging systems.
During the last decade the progress pf prepress technology
towards electronic data handling and of submicronhithography
towards increasing circuit densities imposes newtrends in.
the design of photosensitive polymer coatings In both cases
the use of specific laser sources in irradiation devices requires
the .formulation of new adequate photopolymer systems, especially
from the point ofview of intrinsic energetic and spectral
sensitivity.We wish to review some significant recent advances
in both fields
