UV Curing under Carbon Dioxide

UV coatings are predominantly used in series production of flat substrates. UV curing in a carbon dioxide atmosphere effectively reduces the inhibitory effect of oxygen. Improved curing becomes possible with minimal expenditures of energy and extra equipment. Basic kinetic research in this context demonstrates the expanded scope of procedural and processing possibilities. The short distance between the lamp and the substrate, an essential reason for the preferential use in flat-substrate applications, is overcome. Under carbon dioxide, it is possible to cure with a minimum of extra equipment, with larger distances and reduced lamp power. This allows for less complicated 3D-UV applications even for small production lots.